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关注：1
2013-05-23 12:21
求翻译：Fe51Pt49 thin films with a thickness of 50 nm were deposited on natively oxidized Si 100 substrates by dc magnetron sputtering from a binary Fe50Pt50 alloy target at an argon pressure of 2.0 Pa at room temperature是什么意思？ 待解决
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Fe51Pt49 thin films with a thickness of 50 nm were deposited on natively oxidized Si 100 substrates by dc magnetron sputtering from a binary Fe50Pt50 alloy target at an argon pressure of 2.0 Pa at room temperature
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2013-05-23 12:21:38
本地SI 100直流磁控溅射氧化基板在室温下从一个二进制fe50pt50合金靶在氩气压力2.0 PA fe51pt49与50纳米厚的薄膜沉积
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2013-05-23 12:23:18
正在翻译，请等待...
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2013-05-23 12:24:58
Fe51Pt49薄膜以 50毫微米的厚度在当地被氧化的Si 100 基体被放置了由飞溅从一个二进制Fe50Pt50合金目标的dc磁控管以2.0 Pa氩压力在室温
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2013-05-23 12:26:38
Fe51Pt49 薄膜厚度 50 nm 本机沉积氧化硅 100 衬底磁控溅射从二进制的 Fe50Pt50 合金目标，2.0 的氩压在室温 Pa
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2013-05-23 12:28:18
Fe51Pt49 thin films with a thickness of 50 nm were deposited on natively oxidized Si 100 substrates by dc magnetron sputtering from a binary Fe50Pt50 alloy target at an argon pressure of 2.0 Pa at room temperature
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