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  • 匿名
关注:1 2013-05-23 12:21

求翻译:一般,在同一块基片上解理的样品光致发光强度也存在不同,所以本实验使用RPM2000快速扫描光荧光谱仪,以mapping的方法选取表面发光强度均匀一致的样品用于清洗实验。是什么意思?

待解决 悬赏分:1 - 离问题结束还有
一般,在同一块基片上解理的样品光致发光强度也存在不同,所以本实验使用RPM2000快速扫描光荧光谱仪,以mapping的方法选取表面发光强度均匀一致的样品用于清洗实验。
问题补充:

  • 匿名
2013-05-23 12:21:38
General, the PL intensity with a base chip samples cleavage there are different, so this experiment rpm2000 fast scanning optical fluorescence spectrometer, sample mapping method to select the surface uniform luminous intensity for the cleaning experiments.
  • 匿名
2013-05-23 12:23:18
In general, in the same block-based on-chip to the sample light intensity is also different, so this experiment using RPM 2000 QUICK SCAN The fluorescent spectrum to mapping of the surface intensity method takes an even and uniform samples of the lab is used for cleaning.
  • 匿名
2013-05-23 12:24:58
General, in the sample photoluminescence intensity which cleaves together with the substrate on also exists differently, therefore this experiment uses the RPM2000 rapid scanning light fluorescence spectrometer, uses in by the mapping method selection surface luminous intensity even consistent sampl
  • 匿名
2013-05-23 12:26:38
正在翻译,请等待...
  • 匿名
2013-05-23 12:28:18
正在翻译,请等待...
 
 
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