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  • 匿名
关注:1 2013-05-23 12:21

求翻译:由于同一块基片上解理的样品光致发光强度也存在不同,所以本实验使用RPM2000快速扫描光荧光谱仪,以mapping的方法选取表面发光强度均匀一致的样品用于清洗实验。是什么意思?

待解决 悬赏分:1 - 离问题结束还有
由于同一块基片上解理的样品光致发光强度也存在不同,所以本实验使用RPM2000快速扫描光荧光谱仪,以mapping的方法选取表面发光强度均匀一致的样品用于清洗实验。
问题补充:

  • 匿名
2013-05-23 12:21:38
PL intensity due to the samples of the same piece of substrate cleavage, so this experiment use rpm2000 quick scan ray fluorescence spectrometer, sample mapping method to select the surface uniform luminous intensity for the cleaning experiments.
  • 匿名
2013-05-23 12:23:18
For the same block-based on-chip to the sample light intensity is different, so it is used in this lab 2000 RPM QUICK SCAN The fluorescent spectrum to mapping the surface intensity method takes an even and uniform samples of the lab is used for cleaning.
  • 匿名
2013-05-23 12:24:58
Because cleaves together with the substrate on the sample photoluminescence intensity also exists differently, therefore this experiment uses the RPM2000 rapid scanning light fluorescence spectrometer, uses in by the mapping method selection surface luminous intensity even consistent sample cleaning
  • 匿名
2013-05-23 12:26:38
Because on the same substrate cleavage samples of photoluminescence intensities are different, so this experiment using RPM2000 rapid scanning optical fluorescence spectrometer, mapping method of selecting samples used for the cleaning of the surface luminous intensity uniform experiment.
  • 匿名
2013-05-23 12:28:18
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