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关注：1
2013-05-23 12:21
求翻译：Fe51Pt49 thin films with a thickness of 50 nm were deposited on natively oxidized Si 100 substrates by dc magnetron sputtering from a binary Fe50Pt50 alloy target at an argon pressure of 2.0 Pa at room temperature.是什么意思？ 待解决
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Fe51Pt49 thin films with a thickness of 50 nm were deposited on natively oxidized Si 100 substrates by dc magnetron sputtering from a binary Fe50Pt50 alloy target at an argon pressure of 2.0 Pa at room temperature.
问题补充： |
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2013-05-23 12:21:38
本身从一个二进制fe50pt50合金靶氧化硅100基板2.0 PA的氩气压力在室温直流磁控溅射沉积fe51pt49 50纳米厚的薄膜。
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2013-05-23 12:23:18
正在翻译，请等待...
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2013-05-23 12:24:58
Fe51Pt49薄膜以 50毫微米的厚度在当地被氧化的Si 100 基体被放置了由飞溅从一个二进制Fe50Pt50合金目标的dc磁控管以2.0 Pa氩压力在室温。
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2013-05-23 12:26:38
Fe51Pt49 薄膜厚度 50 nm 本机沉积氧化硅 100 衬底磁控溅射氩压 2.0 的二进制 Fe50Pt50 合金目标从巴勒斯坦权力机构在室温。
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2013-05-23 12:28:18
Fe51Pt49 thin films with a thickness of 50 nm were deposited on natively oxidized Si 100 substrates by dc magnetron sputtering from a binary Fe50Pt50 alloy target at an argon pressure of 2.0 Pa at room temperature.
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