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2013-05-23 12:21
求翻译：Sputter deposition is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a "target," that is source, which then deposits onto a "substrate," such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion o是什么意思？ 待解决
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Sputter deposition is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a "target," that is source, which then deposits onto a "substrate," such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion o
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2013-05-23 12:21:38
Sputter deposition is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a "target," that is source, which then deposits onto a "substrate," such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposit
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2013-05-23 12:23:18
Sputter deposition is a physical vapor deposition (PVD) Method of depositing thin films by sputtering, ejecting material from, that is, "That is a "target source, which then deposits onto a "substrate", such as a silicon wafer Resputtering . Is re-emission of the deposited material during the deposi
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2013-05-23 12:24:58
正在翻译，请等待...
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2013-05-23 12:26:38
Sputter deposition is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a "target," that is source, which then deposits onto a " substrate," such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposi
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2013-05-23 12:28:18
Sputter deposition is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a "target," that is source, which then deposits onto a "substrate," such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposit
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