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关注：1
2013-05-23 12:21
求翻译：Growth parameters such as precursor doses, purge times, and the number of ALD cycles of the MgO and ZnO processes were used in the Zn1xMgxO film deposition process.是什么意思？ 待解决
 悬赏分：1
- 离问题结束还有
Growth parameters such as precursor doses, purge times, and the number of ALD cycles of the MgO and ZnO processes were used in the Zn1xMgxO film deposition process.
问题补充： |
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2013-05-23 12:21:38
的zn1 xMgxO薄膜沉积过程中使用的生长参数，如前体剂量，吹扫时间和ALD的周期的数量的MgO和ZnO进程。
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2013-05-23 12:23:18
正在翻译，请等待...
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2013-05-23 12:24:58
成长参量例如前体药量、清除时间和MgO和ZnO过程的ALD周期的数量用于Zn1 xMgxO影片证言过程。
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2013-05-23 12:26:38
生长参数，如前体的剂量，清除倍，和在 Zn1xMgxO 薄膜沉积过程中使用了限期周期的氧化镁、 氧化锌的进程数。
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2013-05-23 12:28:18
Growth parameters such as precursor doses, purge times, and the number of ALD cycles of the MgO and ZnO processes were used in the Zn1xMgxO film deposition process.
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